Search Results - qi fan

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High-density Plasma for Material Processing

Executive SummaryRF plasma discharges are widely used for materials processing in semiconductor industry and coatings applications. The efficiency of interactions between plasma and materials depends on the plasma density. Conventional RF discharges tend to lose high-energy electrons to the electrodes leading to lower plasma densities and unfavorable...
Published: 8/5/2019   |   Inventor(s): Qi Fan, Thomas Schuelke, Michael Becker, Bocong Zheng
Keywords(s):   Category(s): Materials, Manufacturing Equipment

Single Beam Plasma Source

Executive SummaryPlasma-based ion sources are used in a variety of modern manufacturing processes, such as thin film deposition, etching, and surface engineering. Conventional linear ion sources have a race-track geometry that leads to a wide beam angle, limiting the ability to tune the ion-source interactions. Further advances in these processes require...
Published: 5/24/2019   |   Inventor(s): Qi Fan, Thomas Schuelke, Lars Haubold, Michael Petzold
Keywords(s):   Category(s): Devices, Manufacturing Equipment