Available Technologies

VALUE PROPOSITION

Multiple products have a need for precise surface treatment and thin film deposition with enhanced performance, durability, and efficiency. Various products, from semiconductor devices and solar panels to sensors could benefit. By providing tailored surface properties and superior control over material deposition, ion sources contribute to improved functionality, reduced manufacturing costs, and extended product lifecycles. Improved technology empowers manufacturers to develop solutions that meet the evolving demands of their respective markets, ultimately driving innovation and competitive advantage.

DESCRIPTION OF TECHNOLOGY

This ion source technology is a cutting-edge surface treatment and thin film deposition method that modifies the surface properties of materials. By employing high-energy ions, this technique enables precise control over the deposition process, allowing for the creation of tailored surface characteristics, such as improved adhesion, conductivity, or wear resistance. The versatility of this ion source technology makes it applicable across various industries, including electronics, solar energy, automotive, and aerospace, where enhanced performance and durability are critical. The technology is a cost-effective and efficient alternative to traditional surface treatment methods.

BENEFITS

• Enhanced Surface Reactions
• Improved Thin Film Deposition
• Surface Roughness Modulation
• Reduced Film Damage
• Improved Maintenance
• Compatibility with Various Gases
• Single Beam Control

APPLICATIONS

• Semiconductor Manufacturing
• Display Production
• Solar Panel Fabrication
• Sensors
• Micro-Electro-Mechanical Systems (MEMS

IP Status

US Patent 12,165,829

LICENSING RIGHTS AVAILABLE

All Licensing rights available

Inventors: Qi Hua Fan

Tech ID: TEC2019-0123

For more information about this technology,

Contact Ken Foster, Ph.D. at foste462@msu.edu or +1-517-884-0719