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High-density Plasma for Material Processing

Executive SummaryRF plasma discharges are widely used for materials processing in semiconductor industry and coatings applications. The efficiency of interactions between plasma and materials depends on the plasma density. Conventional RF discharges tend to lose high-energy electrons to the electrodes leading to lower plasma densities and unfavorable...
Published: 8/5/2019   |   Inventor(s): Qi Fan, Thomas Schuelke, Michael Becker, Bocong Zheng
Keywords(s):   Category(s): Materials, Manufacturing Equipment